Title :
Gigahertz SAW filter developed using new submicrometre techniques
Author :
Asai, K. ; Isobe, A. ; Tada, T. ; Hikita, M.
Author_Institution :
Central Res. Lab., Hitachi Ltd., Tokyo, Japan
fDate :
8/17/1995 12:00:00 AM
Abstract :
A photolithographic technique was developed that uses 1/10-reduction photoprinting with a phase-shifting mask to make gigahertz SAW devices. Combined with a positive-type resist, this new technique produces IDT electrodes with smaller deviations in width compared with using a negative-type resist. Very sharp 40 nm thick AI electrodes with 0.4 μm lines and spaces were achieved. A 2.5 GHz SAW filter suitable for optical communication systems was developed
Keywords :
UHF filters; acoustic microwave devices; interdigital transducers; optical communication equipment; phase shifting masks; photolithography; surface acoustic wave resonator filters; 0.4 micron; 2.5 GHz; 40 nm; IDT electrodes; SAW filter; optical communication systems; phase-shifting mask; photolithographic technique; photoprinting; positive-type resist; submicrometre techniques;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19950977
