DocumentCode
889284
Title
Analysis of the Role of High-Brightness Electron Guns in Lithography
Author
Wolfe, John C.
Volume
15
Issue
4
fYear
1980
Firstpage
540
Lastpage
543
Abstract
The development of reliable, high-brightness, temperature-field (TF) emission electron guns promises greater flexibility in electron-beam lithography. Detailed pattern analysis of two IC mask sets was performed for the purpose of identifying those areas of electron-beam lithography where high-brightness guns could be applied to advantage. Potential exists for throughput improvement in both Variable Shaped Spot (VSS) Vector Scanning Systems and in ultra-high-speed Raster Scanning Systems.
Keywords
Electron beam lithography; Electron guns; Integrated circuit technology; Large scale integration; Current density; Electron guns; Fabrication; Lithography; Pattern analysis; Throughput; Variable structure systems; Very high speed integrated circuits; Very large scale integration;
fLanguage
English
Journal_Title
Solid-State Circuits, IEEE Journal of
Publisher
ieee
ISSN
0018-9200
Type
jour
DOI
10.1109/JSSC.1980.1051435
Filename
1051435
Link To Document