Title :
Analysis of the Role of High-Brightness Electron Guns in Lithography
Abstract :
The development of reliable, high-brightness, temperature-field (TF) emission electron guns promises greater flexibility in electron-beam lithography. Detailed pattern analysis of two IC mask sets was performed for the purpose of identifying those areas of electron-beam lithography where high-brightness guns could be applied to advantage. Potential exists for throughput improvement in both Variable Shaped Spot (VSS) Vector Scanning Systems and in ultra-high-speed Raster Scanning Systems.
Keywords :
Electron beam lithography; Electron guns; Integrated circuit technology; Large scale integration; Current density; Electron guns; Fabrication; Lithography; Pattern analysis; Throughput; Variable structure systems; Very high speed integrated circuits; Very large scale integration;
Journal_Title :
Solid-State Circuits, IEEE Journal of
DOI :
10.1109/JSSC.1980.1051435
