DocumentCode :
890701
Title :
Source–Drain Partitioning in MOSFET
Author :
Roy, Ananda S. ; Enz, Christian C. ; Sallese, Jean-Michel
Author_Institution :
Swiss Fed. Inst. of Technol., Lausanne
Volume :
54
Issue :
6
fYear :
2007
fDate :
6/1/2007 12:00:00 AM
Firstpage :
1384
Lastpage :
1393
Abstract :
The Ward-Dutton (WD) partitioning scheme [IEEE Trans. Electron Devices, vol. ED-27, p. 1571, Aug. 1980] is used extensively to develop transient and high-frequency advanced compact models for MOSFET devices. Recently, it has been shown that WD partitioning fails for field-dependent mobility [IEEE Electron Device Lett., vol. 27, p. 674, Aug 2006] or for laterally asymmetrical doping [IEDM Tech. Dig., p.751, Dec. 2004], [IEEE Trans. Electron Devices, vol. 53, p. 270, Feb. 2006]. This paper is aimed at presenting a generalization of the partitioning concept. We show that, although it is not possible to guaranty a partitioning scheme for general operation of the MOSFET, it is possible to show the existence of a partitioning scheme for small-signal operation of the device accounting for both field-dependent mobility and lateral asymmetry. Application of this new concept in capacitance evaluation of lateral asymmetric MOSFET considerably simplifies the existing capacitance-evaluation methodology and accounts for any arbitrary field-dependent mobility. It also gives a mean to physically understand the unusual behavior delta Cdg in lateral asymmetric MOSFET. We also show how failure of the WD partitioning can affect the present compact-modeling Methodologies.
Keywords :
MOSFET; carrier mobility; semiconductor device models; Ward-Dutton partitioning scheme; capacitance-evaluation methodology; field-dependent mobility; lateral asymmetric MOSFET model; laterally asymmetrical doping; small-signal operation; source-drain partitioning; Capacitance; Degradation; Doping; Electron devices; Equations; MOSFET circuits; Semiconductor process modeling; Capacitance; MOSFET; charge partitioning; compact modeling; lateral asymmetry; mobility degradation; noise;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2007.895858
Filename :
4215196
Link To Document :
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