Planar waveguide echelle gratings in silica-on-silicon

Author

Janz, S. ; Balakrishnan, A. ; Charbonneau, S. ; Cheben, P. ; Cloutier, M. ; Delâge, A. ; Dossou, K. ; Erickson, L. ; Gao, M. ; Krug, P.A. ; Lamontagne, B. ; Packirisamy, M. ; Pearson, M. ; Xu, D.-X.

Author_Institution

Nat. Res. Council Canada, Ottawa, Ont., Canada

Volume

16

Issue

2

fYear

2004

Firstpage

503

Lastpage

505

Abstract

Silica planar waveguide echelle grating demultiplexers with 48 channels and 256 channels are described and demonstrated. Polarization effects due to stress birefringence and polarization-dependent grating efficiency have been eliminated using a modified polarization compensator and grating design. The devices have a polarization-dependent wavelength shift of less than 10 pm, and a polarization-dependent loss below 0.2 dB. The 48-channel device has a measured crosstalk of -35 dB, an insertion loss better than 4 dB, and a uniformity of 1 dB across the C-band.

Keywords

birefringence; demultiplexing equipment; diffraction gratings; light polarisation; optical communication equipment; optical crosstalk; optical losses; optical planar waveguides; semiconductor-insulator boundaries; silicon; silicon compounds; wavelength division multiplexing; 48-channel device; C-band; SiO₂-Si; crosstalk; insertion loss; modified polarization compensator; planar waveguide echelle gratings; polarization effects; polarization-dependent grating efficiency; polarization-dependent loss; polarization-dependent wavelength shift; silica planar waveguide echelle grating demultiplexers; silica-on-silicon; stress birefringence; Birefringence; Crosstalk; Gratings; Insertion loss; Loss measurement; Planar waveguides; Polarization; Silicon compounds; Stress; Wavelength measurement;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2003.823139

Filename

1266471