Title :
RF method for determining the sheath thickness in a plasma
Author :
Basu, Joyanta ; Sen, Chitradeep
Abstract :
The letter presents an RF method for determining the sheath thickness of a plane probe immersed in a plasma and biased with a dc voltage. Expressions are derived giving the sheath thickness in terms of the RF impedance of the probe for different regions of the V - iecharacteristic.
Keywords :
Electrons; Impedance measurement; Plasma confinement; Plasma measurements; Plasma properties; Plasma sheaths; Probes; Radio frequency; Resonance; Voltage;
Journal_Title :
Proceedings of the IEEE
DOI :
10.1109/PROC.1967.5997
