Title :
Wide passband wavelength multi/demultiplexer at 1.3/1.55 μm based on etched Fresnel mirror μ
Author :
Aarnio, J. ; Heimala, P. ; Stuns, I.
Author_Institution :
VTT, Tech. Res. Centre of Finland, Semicond. Lab., Espoo, Finland
fDate :
6/1/1992 12:00:00 AM
Abstract :
The design, fabrication and analysis of the performance of an integrated optical wide passband multi/demultiplexer at 1.3 μm and 1.55 μm are presented. The device uses a large angle of incidence totally reflecting Fresnel mirror with average grating period of 44 μm to separate the wavelengths. The multi/demultiplexer is fabricated both on quartz and on silicon substrates using silica-based waveguide technology. The 3-dB passbands exceed 60 nm with crosstalk below -20 dB
Keywords :
diffraction gratings; etching; frequency division multiplexing; integrated optics; mirrors; multiplexing equipment; optical waveguides; optical workshop techniques; 1.3 micron; 1.55 micron; IR; Si substrates; SiO2; average grating period; etched Fresnel mirror; integrated optical wide passband multi/demultiplexer; large angle of incidence; multiplexer design; multiplexer fabrication; quartz; silica-based waveguide technology; totally reflecting Fresnel mirror; wavelength multi/demultiplexer; wavelength separation;
Journal_Title :
Optoelectronics, IEE Proceedings J
