DocumentCode
894836
Title
A fast 16K static RAM built with a silicide enhanced NMOS process
Author
Frederick, Bruce A.
Volume
18
Issue
5
fYear
1983
Firstpage
612
Lastpage
614
Abstract
A 25-ns 16K RAM is described which uses internal asynchronous precharging, a unique column buffer, and latching data lines. The NMOS technology features are 1.3 /spl mu/ L/SUB eff/, molybdenum silicide interconnect, and laser redundancy for yield enhancement.
Keywords
Field effect integrated circuits; Integrated circuit technology; Integrated memory circuits; Large scale integration; Molybdenum compounds; Random-access storage; Redundancy; field effect integrated circuits; integrated circuit technology; integrated memory circuits; large scale integration; molybdenum compounds; random-access storage; redundancy; Breakdown voltage; CMOS technology; Decoding; Energy consumption; Fuses; Impedance; Integrated circuit interconnections; MOS devices; Silicides; Space technology;
fLanguage
English
Journal_Title
Solid-State Circuits, IEEE Journal of
Publisher
ieee
ISSN
0018-9200
Type
jour
DOI
10.1109/JSSC.1983.1052003
Filename
1052003
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