• DocumentCode
    894906
  • Title

    Thickness variation of breakdown field strength in plasma oxidized aluminum films

  • Author

    Nicol, W.S.

  • Volume
    56
  • Issue
    1
  • fYear
    1968
  • Firstpage
    109
  • Lastpage
    110
  • Abstract
    The breakdown field strength in plasma oxidized Al2O3films ranging in thickness from 15 to 600 Å, was observed to exhibit a dependence proportional to s-1/4, where s is oxide thickness. This variation was found to be temperature independent.
  • Keywords
    Aluminum oxide; Capacitance measurement; Dielectric thin films; Electric breakdown; Electrons; Glow discharges; Oxidation; Plasma measurements; Plasma temperature; Thickness measurement;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/PROC.1968.6178
  • Filename
    1448108
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=894906