• DocumentCode
    895636
  • Title

    Exposure-Dose-Rate-Dependence for a CMOS/SOS Memory

  • Author

    Brucker, G.J.

  • Author_Institution
    RCA Laboratories, Princeton, NJ 08540
  • Volume
    28
  • Issue
    6
  • fYear
    1981
  • Firstpage
    4056
  • Lastpage
    4059
  • Abstract
    This study of a 1K RAM demonstrated the basic recovery characteristics previously reported in the literature for MOS capacitors and transistors. High exposure-rate-tests (i.e. 5.3 × 105 rads (Si)/(hr) indicated low-failure-doses of 1 kilorad (mean value of Pass/Fail range) in space qualified memories. The most significant failure effect was identified as due to back-channel-leakage which was traceable to starting substrates. Reduction of exposure rate from 5.3 × 105 to 5.9 rads (Si)/hr increased the minimum-failure-dose to 4.5 kilorads. This improvement could not be predicted by the use of Convolution theory.
  • Keywords
    Annealing; Circuit testing; Convolution; Laboratories; Random access memory; Read-write memory; Silicon; Space vehicles; Substrates; Temperature measurement;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1981.4335674
  • Filename
    4335674