DocumentCode :
895636
Title :
Exposure-Dose-Rate-Dependence for a CMOS/SOS Memory
Author :
Brucker, G.J.
Author_Institution :
RCA Laboratories, Princeton, NJ 08540
Volume :
28
Issue :
6
fYear :
1981
Firstpage :
4056
Lastpage :
4059
Abstract :
This study of a 1K RAM demonstrated the basic recovery characteristics previously reported in the literature for MOS capacitors and transistors. High exposure-rate-tests (i.e. 5.3 × 105 rads (Si)/(hr) indicated low-failure-doses of 1 kilorad (mean value of Pass/Fail range) in space qualified memories. The most significant failure effect was identified as due to back-channel-leakage which was traceable to starting substrates. Reduction of exposure rate from 5.3 × 105 to 5.9 rads (Si)/hr increased the minimum-failure-dose to 4.5 kilorads. This improvement could not be predicted by the use of Convolution theory.
Keywords :
Annealing; Circuit testing; Convolution; Laboratories; Random access memory; Read-write memory; Silicon; Space vehicles; Substrates; Temperature measurement;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1981.4335674
Filename :
4335674
Link To Document :
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