• DocumentCode
    895849
  • Title

    Domain structures due to induced anisotropy and stresses in film heads

  • Author

    Jones, R.E., Jr. ; Holmes, R.D. ; Kasiraj, P.

  • Author_Institution
    IBM Gen. Products Div., San Jose, CA, USA
  • Volume
    25
  • Issue
    5
  • fYear
    1989
  • fDate
    9/1/1989 12:00:00 AM
  • Firstpage
    3203
  • Lastpage
    3205
  • Abstract
    The local anisotropy near the backgap closure of inductive-film heads is generally the result of two superimposed anisotropies. One is the anisotropy induced during deposition of the magnetic yoke in the presence of a magnetic field, and the other is a stress anisotropy whose magnitude and direction depend on the sign and magnitude of the stress-magnetostriction product. The authors present a simple model for these combined anisotropies and the associated domain wall patterns, assuming that the stress-magnetostriction product falls off as r-2, where r is the distance from the center of the backgap closure, which in this case is assumed to be circular. One of the features of the predicted domain wall patterns is a three-wall intersection occurring where the two anisotropies cancel, i.e. where the yoke material is isotropic. Examples of domain walls in the vicinity of a backgap closure of an experimental film head are shown and discussed
  • Keywords
    induced anisotropy (magnetic); magnetic domain walls; magnetic heads; magnetic thin film devices; backgap closure; domain wall patterns; induced anisotropy; inductive-film heads; local anisotropy; magnetic heads; model; stress anisotropy; stress-magnetostriction product; superimposed anisotropies; three-wall intersection; Anisotropic magnetoresistance; Magnetic anisotropy; Magnetic domain walls; Magnetic domains; Magnetic heads; Magnetic materials; Magnetization; Magnetostriction; Perpendicular magnetic anisotropy; Tensile stress;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.42253
  • Filename
    42253