DocumentCode :
896311
Title :
A new technique for measuring MOSFET inversion layer mobility
Author :
Huang, Cheng-Liang ; Faricelli, John V. ; Arora, Narain D.
Author_Institution :
Digital Equipment Corp., Hudson, MA, USA
Volume :
40
Issue :
6
fYear :
1993
fDate :
6/1/1993 12:00:00 AM
Firstpage :
1134
Lastpage :
1139
Abstract :
An experimental technique for accurately determining both the inversion charge and the channel mobility μ of a MOSFET is presented. With this new technique, the inversion charge is measured as a function of the gate and drain voltages. This improvement allows the channel mobility to be extracted independent of drain voltage VDS over a wide range of voltages (VDS=20-100 mV). The resulting μ(VGS) curves for different VDS show no drastic mobility roll-off at V GS near VTH. This suggests that the roll-off seen in the mobility data extracted using the split C- V method is probably due to inaccurate inversion charge measurements instead of Coulombic scattering
Keywords :
carrier mobility; charge measurement; electric variables measurement; insulated gate field effect transistors; inversion layers; 20 to 100 mV; MOSFET inversion layer mobility; channel mobility; drain voltages; gate voltage; inversion charge; measurement technique; mobility roll-off; Capacitance; Capacitance-voltage characteristics; Charge measurement; Current measurement; Data mining; Frequency; Intrusion detection; MOSFET circuits; Q measurement; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.214740
Filename :
214740
Link To Document :
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