DocumentCode :
896728
Title :
The Role of Volume Inversion on the Intrinsic RF Performance of Double-Gate FinFETs
Author :
Curatola, Gilberto ; Nuttinck, Sebastien
Author_Institution :
NXP Semicond., Heverlee
Volume :
54
Issue :
1
fYear :
2007
Firstpage :
141
Lastpage :
150
Abstract :
Quantum interactions between the inversion channels of multigate devices and their resulting effects on charge distribution and carrier mobility are analyzed in this paper. Results of this analysis are then used to assess the role of volume inversion on the intrinsic RF performance of double-gate FinFETs. Thin-fin devices are beneficial to low-operating and high-performance powers, and wideband RF blocks, while they are detrimental to low-power cross coupled pair-based RF oscillators, and are more power hungry for high-performance oscillators. Also, we highlight that the intrinsic capacitance variation induced by the fin volume inversion dominates the power and wideband RF performance of FinFETs over the variation in carrier mobility. Accurate definition of fin below 8-10 nm will enable extreme RF performance devices
Keywords :
MOSFET; Poisson equation; Schrodinger equation; carrier density; carrier mobility; semiconductor device models; RF oscillators; carrier mobility; charge distribution; double-gate FinFET; fin volume inversion; intrinsic RF performance; intrinsic capacitance variation; inversion channels; multigate devices; quantum effects; thin fin devices; CMOS technology; Electron mobility; FinFETs; Microwave technology; Oscillators; Performance analysis; Potential well; Quantum capacitance; Radio frequency; Wideband; FinFET; RF; quantum effects; volume inversion;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2006.887224
Filename :
4039691
Link To Document :
بازگشت