Bias effects in facing targets sputtering on the structure and magnetic properties of NdFeMo thin films

Author

Sun, Chang Qing ; Jiang, En Yong ; Zhang, Xi Xiang ; Liu, Yu Guang ; Lu, Qi

Author_Institution

Dept. of Phys., Tianjin Univ., China

Volume

25

Issue

5

fYear

1989

fDate

9/1/1989 12:00:00 AM

Firstpage

3339

Lastpage

3340

Abstract

The use of DC substrate biasing, V_b, to modulate the structure and magnetic properties of NdFeMo films prepared by facing-target sputtering was investigated. It was found that films of high quality with a smoother surface and denser structure could be produced through the promotion of adatom diffusion and impurity resputtering by applying a V_b lower than -120 V during sputtering. In particular, the perpendicular magnetic anisotropy was improved as a result of adatom combination and structure orientation produced by V_b from (-70 to -120 V). A resputtering effect is dominant at higher values of V_b (>-150) and the orientation of the films is adversely affected

Keywords

ferromagnetic properties of substances; iron alloys; magnetic anisotropy; magnetic thin films; molybdenum; neodymium alloys; sputter deposition; -70 to -120 V; DC substrate biasing; NdFeMo thin films; adatom combination; adatom diffusion; bias effects; denser structure; facing targets sputtering; film orientation; film structure; high quality films; impurity resputtering; magnetic properties; perpendicular magnetic anisotropy; resputtering effect; smoother surface; structure orientation; Magnetic films; Magnetic materials; Magnetic modulators; Magnetic properties; Magnetic separation; Optical films; Optical filters; Optical recording; Sputtering; Substrates;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.42296

Filename

42296