• DocumentCode
    897780
  • Title

    Constraints on the Application of 0.5-μm MOSFET´s to ULSI Systems

  • Author

    Takeda, Eiji ; Jones, Geraint A C ; Ahmed, H.

  • Volume
    20
  • Issue
    1
  • fYear
    1985
  • fDate
    2/1/1985 12:00:00 AM
  • Firstpage
    242
  • Lastpage
    247
  • Abstract
    The characteristics of a MOSFET with an Leff= 0.5μ. which is a building element of the next generation of ULSI\´s,are described from two viewpoints 1) "deviation" from the scaling law and 2) "system level scaling" and are compared with those of 1.3-, 2-, and 3-μm design rules. In the light of the fact that further improvements in the characteristics of small-sized devices are diminishing, it is mentioned that from now on it will be more necessary to concentrate on the system-oriented approach, rather than device and process technologies. In addition, to aid the selection of a new standard for power supply voltage, the allowable operating bias regions in 0.5-μm devices are discussed.
  • Keywords
    Field effect integrated circuits; Insulated gate field effect transistors; Semiconductor device models; VLSI; Conductivity; Electron beams; Integrated circuit interconnections; Lithography; MOSFET circuits; Power supplies; Transistors; Ultra large scale integration; Very large scale integration; Voltage;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.1985.1052299
  • Filename
    1052299