DocumentCode :
897851
Title :
Hot-Electron-Induced MOSFET Degradation - Model, Monitor, and Improvement
Author :
Hu, Chenming ; Tam, Simon C. ; Hsu, Fu-Chieh ; Ko, Ping-Keung ; Chan, Tung-Yi ; Terrill, Kyle W.
Volume :
20
Issue :
1
fYear :
1985
Firstpage :
295
Lastpage :
305
Abstract :
Evidence suggests that MOSFET degradation is due to interface-states generation by electrons having 3.7 eV and higher energies. This critical energy and the observed time dependence is explained with a physical model involving the breaking of the = Si/sub s/H bonds. The device lifetime /spl tau/ is proportional to...
Keywords :
Hot carriers; Insulated gate field effect transistors; Semiconductor device models; Charge carrier processes; Degradation; Dielectrics; Electron emission; Electron traps; Hot carriers; Interface states; MOSFET circuits; Monitoring; Voltage;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.1985.1052306
Filename :
1052306
Link To Document :
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