DocumentCode
897952
Title
Analysis of Kink Characteristics in Silicon-on-Insulator MOSFET´s Using Two-Carrier Modeling
Author
Kato, Koichi ; Wada, Tetsunori ; Taniguchi, Kenji
Volume
20
Issue
1
fYear
1985
Firstpage
378
Lastpage
382
Abstract
An exact SOI device simulator applicable to prediction of the transistor characteristics in high-current region is developed. In the simulator, the basic two-dimensional Poisson´s and current continuity equations are numerically solved under steady-state condition. To obtain a stable and rapid convergence in the numerical scheme, a newly developed alternative step solving method is implemented. Using this simulator, the drain current kink effect, a typical phenomenon for substrate-floating devices, is exactly simulated for the first time. The physical mechanism of this phenomenon is also clarified. The simulated results indicate that kink effects are suppressed by using Iow-lifetime SOI substrates.
Keywords
Digital simulation; Insulated gate field effect transistors; Semiconductor device models; Character generation; Charge carrier processes; DC generators; Ionization; MOSFET circuits; Partial differential equations; Poisson equations; Predictive models; Silicon on insulator technology; Spontaneous emission;
fLanguage
English
Journal_Title
Solid-State Circuits, IEEE Journal of
Publisher
ieee
ISSN
0018-9200
Type
jour
DOI
10.1109/JSSC.1985.1052317
Filename
1052317
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