• DocumentCode
    897952
  • Title

    Analysis of Kink Characteristics in Silicon-on-Insulator MOSFET´s Using Two-Carrier Modeling

  • Author

    Kato, Koichi ; Wada, Tetsunori ; Taniguchi, Kenji

  • Volume
    20
  • Issue
    1
  • fYear
    1985
  • Firstpage
    378
  • Lastpage
    382
  • Abstract
    An exact SOI device simulator applicable to prediction of the transistor characteristics in high-current region is developed. In the simulator, the basic two-dimensional Poisson´s and current continuity equations are numerically solved under steady-state condition. To obtain a stable and rapid convergence in the numerical scheme, a newly developed alternative step solving method is implemented. Using this simulator, the drain current kink effect, a typical phenomenon for substrate-floating devices, is exactly simulated for the first time. The physical mechanism of this phenomenon is also clarified. The simulated results indicate that kink effects are suppressed by using Iow-lifetime SOI substrates.
  • Keywords
    Digital simulation; Insulated gate field effect transistors; Semiconductor device models; Character generation; Charge carrier processes; DC generators; Ionization; MOSFET circuits; Partial differential equations; Poisson equations; Predictive models; Silicon on insulator technology; Spontaneous emission;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.1985.1052317
  • Filename
    1052317