Double-heterojunction lattice-matched and pseudomorphic InGaAs HEMT with delta -doped InP supply layers and p-InP barrier enhancement layer grown by LP-MOVPE

The design and fabrication using low-pressure metalorganic vapor phase epitaxy (LP-MOVPE) of a HEMT on InP substrate that only uses InP and In/sub x/Ga/sub 1-x/As as layer materials are reported. Lattice-matched (x=0.53) and strained (x=0.68) channels and a double-heterojunction design were used in this investigation. The DC performance of the 0.8- mu m devices at 300 and 77 K was excellent for both cases. Improvements of 9 and 22% in g/sub mext/ with the strain were measured at the same temperatures, in accordance with theoretical predictions. The approach described may serve as a very useful alternative, especially in MOVPE growth, to InAlAs containing structures because it eliminates many of the troublesome effects such as kinks, deep levels, interface states, high output conductances, and gate leakage, which are to a large extent attributed to impurity-Al interactions. The use of lattice-mismatched InGaAs as channel layer increases the conduction band offset to InP, the DH structure improves both confinement and current, and the p-InP barrier layer results in sufficiently high quasi-Schottky barriers.<>