A 1-Mbit CMOS dynamic RAM with a divided bitline matrix architecture

A 1-Mb dynamic RAM has been fabricated using 1.2-/spl mu/m double-level metal CMOS technology. A novel divided bitline matrix architecture allows the conventional double-polysilicon planar memory cell to be used without sacrificing signal-to-noise (S/N) ratio or die efficiency. Optimized for high bandwidth, the device uses static column circuitry and a 256K/spl times/4 organization to achieve data rates >180 Mb/s at worst-case voltage and temperature conditions. The 5.97-mm/spl times/11.4-mm die incorporates a flexible laser blown fuse link redundancy scheme which can repair a wide variety of fabrication defects. Typical row access and cycle times are 85 and 190 ns, respectively, achieving >21-Mb/s bandwidth in the non-optimized row access mode. Although some DC power is dissipated in static circuitry, active power consumption has been kept to 225 mW (45 mA), and standby power consumption has been reduced to 2.5 mW (0.5 mA).