• DocumentCode
    900358
  • Title

    GaAs on Si-the ultimate wafer?

  • Author

    Dettmer, Roger

  • Volume
    35
  • Issue
    4
  • fYear
    1989
  • fDate
    4/20/1989 12:00:00 AM
  • Firstpage
    136
  • Lastpage
    137
  • Abstract
    There are two basic reasons why growing GaAs on Si could be worthwhile. First, it could provide a low-cost, robust source of GaAs wafers. Growing single crystals of GaAs is relatively difficult, and GaAs wafers are generally smaller and more expensive than their silicon counterparts. They are also more fragile and prone to breakage. Secondly, it would allow high-speed digital Si, high-frequency analogue GaAs and the interchip connections to be integrated on a single substrate. The author discusses the defect densities of the GaAs layer due to lattice mismatch and then describes how the problem can be overcome by using strained layer superlattices grown by MOVPE
  • Keywords
    III-V semiconductors; elemental semiconductors; gallium arsenide; integrated circuit technology; semiconductor growth; semiconductor superlattices; silicon; vapour phase epitaxial growth; MOVPE; defect densities; interchip connections; lattice mismatch; strained layer superlattices; wafer;
  • fLanguage
    English
  • Journal_Title
    IEE Review
  • Publisher
    iet
  • ISSN
    0953-5683
  • Type

    jour

  • Filename
    215649