DocumentCode
901568
Title
Temperature Effects on Failure and Annealing Behavior in Dynamic Random Access Memories
Author
Wilkin, Neil D. ; Self, Charles T.
Author_Institution
U.S. Army Electronics Research and Development Command Harry Diamond Laboratories Adelphi, Maryland 20783
Volume
29
Issue
6
fYear
1982
Firstpage
1669
Lastpage
1673
Abstract
Total dose failure levels and long time anneal characteristics of dynamic random access memories are measured while the devices are exercised under actual use conditions. These measurements were performed over the temperature range of -60 C to +70 C. The total dose failure levels are shown to decrease with increasing temperature. The anneal characteristics are shown to result in both an increase and decrease in the measured number of errors as a function of time. Finaly a description of the test instrumentation and irradiation procedures are given.
Keywords
Annealing; DRAM chips; Heat transfer; Instruments; Large scale integration; Temperature control; Temperature distribution; Temperature measurement; Testing; Time measurement;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1982.4336425
Filename
4336425
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