• DocumentCode
    901568
  • Title

    Temperature Effects on Failure and Annealing Behavior in Dynamic Random Access Memories

  • Author

    Wilkin, Neil D. ; Self, Charles T.

  • Author_Institution
    U.S. Army Electronics Research and Development Command Harry Diamond Laboratories Adelphi, Maryland 20783
  • Volume
    29
  • Issue
    6
  • fYear
    1982
  • Firstpage
    1669
  • Lastpage
    1673
  • Abstract
    Total dose failure levels and long time anneal characteristics of dynamic random access memories are measured while the devices are exercised under actual use conditions. These measurements were performed over the temperature range of -60 C to +70 C. The total dose failure levels are shown to decrease with increasing temperature. The anneal characteristics are shown to result in both an increase and decrease in the measured number of errors as a function of time. Finaly a description of the test instrumentation and irradiation procedures are given.
  • Keywords
    Annealing; DRAM chips; Heat transfer; Instruments; Large scale integration; Temperature control; Temperature distribution; Temperature measurement; Testing; Time measurement;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1982.4336425
  • Filename
    4336425