DocumentCode :
902259
Title :
Large-signal linearity of scaled MOS transistors
Author :
Garverick, Steven L. ; Sodini, Charles G.
Volume :
22
Issue :
2
fYear :
1987
fDate :
4/1/1987 12:00:00 AM
Firstpage :
282
Lastpage :
286
Abstract :
The tendency toward linearity between saturated drain current and gate-to-source voltage exhibited by small-dimension MOS transistors is explored from the standpoint of possible exploitation in analog MOS circuits. Nonlinearity is calculated using a simple MOS model which includes the high field dependence of inversion-layer carrier mobility. The nonlinearity for devices with a wide range of channel lengths and gate dielectric thicknesses was measured and is compared to results from the model. Some problems associated with the use of short-channel MOS transistors in analog circuits are discussed.
Keywords :
Field effect integrated circuits; Insulated gate field effect transistors; Semiconductor device models; field effect integrated circuits; insulated gate field effect transistors; semiconductor device models; Analog circuits; Circuit optimization; Dielectric devices; Dielectric measurements; Linearity; MOSFETs; Signal processing; Thickness measurement; Transconductance; Voltage;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.1987.1052714
Filename :
1052714
Link To Document :
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