Title :
Effect of glow discharge on chromium thin-film resistance
Author :
Dembicka¿¿Jellonkowa, S. ; Murawski, E.
Author_Institution :
Wroc¿aw Technical University, Wroc¿aw, Poland
fDate :
8/1/1966 12:00:00 AM
Abstract :
The resistivity of thin vacuum-evaporated chromium films varies significantly after deposition. Glow-discharge treatment immediately after deposition slowly increases the sheet resistance, and improves its stability during exposure to air and subsequent heat aging. This treatment enables a stable chromium film to be obtained with a sheet resistivity above 400 ¿/square.
Keywords :
chromium; discharges (electric); electrical conductivity; films; glow discharges; instrumentation; integrated circuits; metals; resistors;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19660244
