Title :
Single-electron effect in PtSi/porous Si Schottky junctions
Author :
Raissi, Farshid ; Abrishamian, M. Sadegh ; Emadi, Tahere
Author_Institution :
Electr. Eng. Dept., K. N. Toosi Univ. of Technol., Tehran, Iran
fDate :
3/1/2004 12:00:00 AM
Abstract :
PtSi/porous Si schottky junctions exhibit a breakdown type current-voltage (I-V) curve in reverse bias mode. Below breakdown their current density is much less than regular PtSi/Si junctions. The breakdown voltage decreases with application of infrared radiation for both n and p-type junctions. N-type junctions are sensitive to IR wavelengths of up to 7 μm even at room temperature. The small reverse bias current, the change of breakdown voltage with radiation, and IR sensitivity at room temperature can all be explained by single-electron effect. Numerical results show that representative porous schottky junctions exhibit depletion capacitances in 10-19 f range which is enough to observe single-electron effect at room temperature. Single-electron effect and avalanche multiplication can explain existing experimental data.
Keywords :
Coulomb blockade; Schottky barriers; elemental semiconductors; platinum alloys; semiconductor-metal boundaries; silicon; silicon alloys; Coulomb blockade; IR detectors; IR wavelengths; PtSi-Si; avalanche multiplication; breakdown type current-voltage curve; breakdown voltage; current density; depletion capacitance; infrared radiation; n-type junction; p-type junction; porous Schottky junctions; reverse bias current; reverse bias mode; single-electron effect; Capacitance; Conductivity; Current density; Electric breakdown; Electric resistance; Electrons; Etching; Infrared detectors; Temperature distribution; Temperature sensors;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2003.822471