Magnetoresistance and Magnetic Anisotropy Properties of Strain-Induced Co/Ag Multilayer Films

Author

Rizal, C.S. ; Ueda, Y.

Author_Institution

Dept. of Electr. & Comput. Eng., Univ. of British Columbia, Vancouver, BC

Volume

45

Issue

6

fYear

2009

fDate

6/1/2009 12:00:00 AM

Firstpage

2399

Lastpage

2402

Abstract

We report on the magnetoresistance (MR) properties of [Co(tCo)/Ag 1.5 nm]₂₀ multilayer and alloy films grown with the pulse electrochemical deposition on a polyamide substrate (1 cm²). The induced uniaxial magnetic anisotropy was observed due to the effect of strain in all the multilayer films. The multilayer [Co 1.5 nm/Ag 1.5 nm]₂₀ showed a minimum hysteresis loss. The maximum MR ratio for Co/Ag was 9.2% at 1 kOe. A remarkable difference of magnetic field dependence of the magnetoresistance ratio was observed, corresponding to the orientation of magnetization curves.

Keywords

cobalt; electrodeposition; magnetic anisotropy; magnetic hysteresis; magnetic multilayers; magnetic thin films; magnetoresistance; polymers; silver; Co-Ag; electrochemical deposition; hysteresis loss; magnetic anisotropy properties; magnetic field dependency; magnetization curves; magnetoresistance properties; strain-induced multilayer films; Anisotropy; Co/Ag; magnetoresistance; multilayer; pulse electrodeposition;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2009.2018588

Filename

4957699