Title :
Magnetoresistance and Magnetic Anisotropy Properties of Strain-Induced Co/Ag Multilayer Films
Author :
Rizal, C.S. ; Ueda, Y.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of British Columbia, Vancouver, BC
fDate :
6/1/2009 12:00:00 AM
Abstract :
We report on the magnetoresistance (MR) properties of [Co(tCo)/Ag 1.5 nm]20 multilayer and alloy films grown with the pulse electrochemical deposition on a polyamide substrate (1 cm2). The induced uniaxial magnetic anisotropy was observed due to the effect of strain in all the multilayer films. The multilayer [Co 1.5 nm/Ag 1.5 nm]20 showed a minimum hysteresis loss. The maximum MR ratio for Co/Ag was 9.2% at 1 kOe. A remarkable difference of magnetic field dependence of the magnetoresistance ratio was observed, corresponding to the orientation of magnetization curves.
Keywords :
cobalt; electrodeposition; magnetic anisotropy; magnetic hysteresis; magnetic multilayers; magnetic thin films; magnetoresistance; polymers; silver; Co-Ag; electrochemical deposition; hysteresis loss; magnetic anisotropy properties; magnetic field dependency; magnetization curves; magnetoresistance properties; strain-induced multilayer films; Anisotropy; Co/Ag; magnetoresistance; multilayer; pulse electrodeposition;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2009.2018588
