DocumentCode
907689
Title
A negative resistance diode based upon double injection in thallium-doped silicon
Author
Henderson, H.T. ; Ashley, K.L.
Volume
57
Issue
9
fYear
1969
Firstpage
1677
Lastpage
1677
Abstract
Limited success is reported in growing a thallium-doped silicon crystal, partially compensated with phosphorus. A diode constructed of this material gives a negative-differential resistance at the onset of double injection.
Keywords
Bandwidth; Electron traps; Equations; Impurities; Oscilloscopes; Semiconductor diodes; Silicon; Tail; Temperature; Thermal resistance;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/PROC.1969.7368
Filename
1449298
Link To Document