DocumentCode
908382
Title
Recent datareviews from EMIS. Diffusion coefficient of oxygen in silicon, temperature dependence
Volume
132
Issue
4
fYear
1985
fDate
8/1/1985 12:00:00 AM
Firstpage
196
Lastpage
197
Keywords
diffusion in solids; elemental semiconductors; silicon; O diffusion; O diffusivity; Si; absolute temperature; diffusion coefficient; semiconductor; temperature dependence;
fLanguage
English
Journal_Title
Solid-State and Electron Devices, IEE Proceedings I
Publisher
iet
ISSN
0143-7100
Type
jour
DOI
10.1049/ip-i-1.1985.0044
Filename
4643956
Link To Document