Fabrication of multimode polymeric waveguides and micromirrors using deep X-ray lithography

Author

Kim, Joon-Sung ; Kim, Jang-Joo

Author_Institution

Dept. of Mater. Sci. & Eng., Kwangju Inst. of Sci. & Technol., Gwangju, South Korea

Volume

16

Issue

3

fYear

2004

fDate

3/1/2004 12:00:00 AM

Firstpage

798

Lastpage

800

Abstract

Multimode polymeric waveguides and 45° micromirrors have been fabricated using deep X-ray lithography. Polymethylmetacrylate was used as a core layer and silica and silicone elastomer as a lower and upper cladding layer, respectively. The propagation loss of the waveguide was 0.54 dB/cm at 830 nm and the loss of micromirrors was less than 0.43 dB at the wavelength. The X-ray lithography technique offers the controllability of mirror angles to 45° and -45° so that it gives flexibility to the system architecture of optical interconnections.

Keywords

X-ray lithography; elastomers; micromirrors; optical fabrication; optical interconnections; optical losses; optical polymers; optical waveguides; 830 nm; cladding layer; core layer; deep X-ray lithography; micromirrors fabrication; mirror angles controllability; multimode polymeric waveguides fabrication; optical interconnections; polymethylmetacrylate; propagation loss; silica elastomer; silicone elastomer; Controllability; Micromirrors; Mirrors; Optical device fabrication; Optical losses; Optical waveguides; Polymers; Propagation losses; Silicon compounds; X-ray lithography;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2004.823694

Filename

1269799