Title :
Diffusion of boron, phosphorus, arsenic, and antimony into
Author :
Chan, Tak-Ming Cyrus
fDate :
4/1/1970 12:00:00 AM
Abstract :
The diffusions of boron, phosphorus, arsenic, and antimony into
Keywords :
Boron; Electrical resistance measurement; Fourier transforms; Holographic optical components; Holography; Image reconstruction; Optical filters; Optical modulation; Silicon; Temperature distribution;
Journal_Title :
Proceedings of the IEEE
DOI :
10.1109/PROC.1970.7699
