Title :
Channel Length Dependence of the Body-Factor Effect in NMOS Devices
Author :
Simard-Normandin, Martine
Author_Institution :
Research and Development Laboratory, Fairchild Camera and Instrument Corp., Palo Alto, CA, USA
fDate :
1/1/1983 12:00:00 AM
Abstract :
The dependence of threshold voltage on substrate bias in NMOS devices is reevaluated in the light of a large sample of data for short-channel length devices (0.8 ?m < L < 8 ?m). Existing models [1], [2] do not fit the data with the necessary accuracy for circuit simulation of short channel devices. A new model involving only process parameters is presented which may also be used to evaluate xj and Nsub from a limited amount of observations if long channel devices are not available. Agreement with SUPREM is excellent.
Keywords :
Analytical models; Capacitors; Circuit simulation; Equations; Helium; MOS devices; MOSFETs; Semiconductor process modeling; Threshold voltage; Very large scale integration;
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
DOI :
10.1109/TCAD.1983.1270015