DocumentCode :
912430
Title :
A Reevaluation of Worst-Case Postirradiation Response for Hardened MOS Transistors
Author :
Fleetwood, D.M. ; Dressendorfer, P.V. ; Turpin, D.C.
Author_Institution :
Sandia National Laboratories P.0. Box 5800 Albuquerque, New Mexico 87185
Volume :
34
Issue :
6
fYear :
1987
Firstpage :
1178
Lastpage :
1183
Abstract :
The "worst-case" postirradiation response of Sandia hardened n-channel transistors following Co-60 exposure to total dose levels of system interest is demonstrated to occur for zero-volt bias during radiation, and positive bias during a subsequent anneal. This observation is explained in terms of oxide-trapped and interface-state charge buildup and anneal. Additional results are presented which suggest that, for future technologies with very thin gate oxides, worst-case device leakage during irradiation may well occur for zero-volt irradiations. These results highlight the importance of periodically reevaluating the response of MOS devices during and after irradiation to determine worst-case test conditions, particularly as technologies advance and gate insulators become thinner.
Keywords :
Annealing; CMOS technology; Circuits; Degradation; Laboratories; Leakage current; MOS devices; MOSFETs; Space technology; Threshold voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1987.4337449
Filename :
4337449
Link To Document :
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