DocumentCode :
912468
Title :
Versatile GaAs triangular barrier transistor structure grown by molecular beam epitaxy
Author :
Al-Bustani, A.A. ; Rees, P.K.
Author_Institution :
Lancashire Polytechnic, Faculty of Technology, School of Electrical and Electronic Engineering, Preston, UK
Volume :
134
Issue :
6
fYear :
1987
fDate :
12/1/1987 12:00:00 AM
Firstpage :
171
Lastpage :
173
Abstract :
An n-type GaAs triangular barrier transistor (TBT) has been grown by molecular beam epitaxy. Log Io against VCE and linear IC/VCE characteristics have been measured using voltage and current sources to apply the base bias. For a 100 ohm load resistor, the TBT has a power gain of 12.8. An outline theory explaining the results is presented.
Keywords :
III-V semiconductors; bipolar transistors; gallium arsenide; molecular beam epitaxial growth; power transistors; GaAs; III-V semiconductors; bipolar power transistor; molecular beam epitaxy; n-type; triangular barrier transistor;
fLanguage :
English
Journal_Title :
Solid-State and Electron Devices, IEE Proceedings I
Publisher :
iet
ISSN :
0143-7100
Type :
jour
DOI :
10.1049/ip-i-1.1987.0035
Filename :
4644386
Link To Document :
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