• DocumentCode
    912551
  • Title

    Heterostructure semiconductor Raman laser

  • Author

    Suto, K. ; Kimura, T. ; Nishizawa, J.

  • Author_Institution
    Tohoku University, Research Institute of Electrical Communication, Sendai, Japan
  • Volume
    134
  • Issue
    4
  • fYear
    1987
  • fDate
    8/1/1987 12:00:00 AM
  • Firstpage
    215
  • Lastpage
    220
  • Abstract
    This paper describes the first lasing experiment of the heterostructure semiconductor Raman laser with a GaP Raman active layer as thin as 15 ¿¿m and AlxGa1¿¿xP cladding layers for optical confinement, which should be a step towards realising a semiconductor Raman laser pumped by a semiconductor injection laser applicable to wideband optical communication. Also, the four-layer structure Raman laser is reported, by which the strain-induced optical anisotropy caused by the lattice mismatching can be reduced.
  • Keywords
    III-V semiconductors; Raman lasers; aluminium compounds; gallium compounds; semiconductor junction lasers; 15 micron; AlxGa1-xP cladding layers; GaP Raman active layer; GaP-AlxGa1-xP; four-layer structure Raman laser; heterostructure semiconductor Raman laser; lattice mismatching; optical confinement; semiconductor injection laser; semiconductors; strain-induced optical anisotropy; wideband optical communication;
  • fLanguage
    English
  • Journal_Title
    Optoelectronics, IEE Proceedings J
  • Publisher
    iet
  • ISSN
    0267-3932
  • Type

    jour

  • DOI
    10.1049/ip-j.1987.0038
  • Filename
    4644396