DocumentCode :
9127
Title :
High-Performance Current Saturating Graphene Field-Effect Transistor With Hexagonal Boron Nitride Dielectric on Flexible Polymeric Substrates
Author :
Jongho Lee ; Tae-Jun Ha ; Parrish, Kristen N. ; Chowdhury, S.F. ; Li Tao ; Dodabalapur, Ananth ; Akinwande, Deji
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Texas at Austin, Austin, TX, USA
Volume :
34
Issue :
2
fYear :
2013
fDate :
Feb. 2013
Firstpage :
172
Lastpage :
174
Abstract :
Graphene transistors using hexagonal boron nitride as the gate dielectric are implemented on mechanically flexible polyimide films. Current saturation is observed for the first time in graphene transistors on a plastic substrate. An atomically smooth insulating surface is achieved with the proposed capture-release process and two-step annealing process, resulting in subnanometer surface roughness. The device shows strong electrical performance: Extracted mobility exceeds 2300 cm2/V·s for both electron and hole transport, and drive current is over 300 μS/μm. This transport symmetry affords frequency doublers with high spectral purity and a conversion gain of - 29.5 dB and output power of -22.2 dBm, representing the highest performance for graphene transistors on flexible substrates.
Keywords :
III-V semiconductors; MOSFET; annealing; boron compounds; chemical vapour deposition; dielectric devices; electron mobility; flexible electronics; frequency multipliers; graphene; hole mobility; plastics; substrates; surface roughness; wide band gap semiconductors; C-BN; atomically smooth insulating surface; capture-release process; conversion gain; drive current; electrical performance; electron transport; flexible polymeric substrates; frequency doublers; gain -29.5 dB; hexagonal gate dielectric; high spectral purity; high-performance current saturating graphene field-effect transistor; hole transport; mechanically flexible polyimide films; mobility extraction; plastic substrate; subnanometer surface roughness; transport symmetry; two-step annealing process; Dielectrics; Graphene; Logic gates; Rough surfaces; Substrates; Surface treatment; Transistors; Chemical vapor deposition (CVD) graphene; RF and analog device; flexible nanoelectronics; hexagonal boron nitride (h-BN);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2012.2233707
Filename :
6410337
Link To Document :
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