DocumentCode :
912894
Title :
Reliability Study of GaAs MESFET´s
Author :
Irie, Toshiaki ; Nagasako, Isamu ; Kohzu, Hideaki ; Sekido, Kenji
Volume :
24
Issue :
6
fYear :
1976
fDate :
6/1/1976 12:00:00 AM
Firstpage :
321
Lastpage :
328
Abstract :
Failure modes have been studied phenomenologically on a small-signal GaAs MESFET with a 1mu m aluminum gate. Three major failure modes have been revealed, i.e., gradual degradation due to source and drain contact degradation, catastrophic damage due to surge pulse, and instability or reversible drift of electrical characteristics during operation. To confirm the product quality and to assure the device reliability, a quality assurance program has been designed and incorporated in a production line. A cost-effective lifetime prediction method is presented that utilizes correlations between RF parameters and dc parameters calculated using an equivalent circuit model. Mean time to failure (MTTF) value of over 108 h has been obtained for the GaAs MESFET for an operating channel temperature of 100°C.
Keywords :
Aluminum; Contacts; Degradation; Electric variables; Gallium arsenide; MESFETs; Prediction methods; Production; Quality assurance; Surges;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/TMTT.1976.1128850
Filename :
1128850
Link To Document :
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