• DocumentCode
    913429
  • Title

    Transient Radiation Effects in SOI Static RAM Cells

  • Author

    Mikawa, R.E. ; Ackermann, M.R.

  • Author_Institution
    Sandia National Laboratories Albuquerque, New Mexico 87185
  • Volume
    34
  • Issue
    6
  • fYear
    1987
  • Firstpage
    1698
  • Lastpage
    1703
  • Abstract
    Recent transient radiation experiments have shown a substrate bias dependence on the logic upset levels of a silicon-on-insulator (SOI) technology. From this data, it was concluded that secondary photocurrents generated by the parasitic bipolar junction transistors (BJTs) were responsible for the observed difference in the bias dependent transient radiation induced upset thresholds. In this report we present our results obtained from computer simulations of the transient radiation response of the SOI technology. These results support a possible explanation for the bias dependent logic upset levels experimentally observed. Parasitic BJT gain calculations, gain modulation and substrate bias effects on transient upset thresholds in static random access memory (SRAM) cells are discussed.
  • Keywords
    Body regions; CMOS technology; Charge carrier density; Doping; Isolation technology; Logic; Photoconductivity; Radiation effects; Read-write memory; Substrates;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1987.4337539
  • Filename
    4337539