DocumentCode
913429
Title
Transient Radiation Effects in SOI Static RAM Cells
Author
Mikawa, R.E. ; Ackermann, M.R.
Author_Institution
Sandia National Laboratories Albuquerque, New Mexico 87185
Volume
34
Issue
6
fYear
1987
Firstpage
1698
Lastpage
1703
Abstract
Recent transient radiation experiments have shown a substrate bias dependence on the logic upset levels of a silicon-on-insulator (SOI) technology. From this data, it was concluded that secondary photocurrents generated by the parasitic bipolar junction transistors (BJTs) were responsible for the observed difference in the bias dependent transient radiation induced upset thresholds. In this report we present our results obtained from computer simulations of the transient radiation response of the SOI technology. These results support a possible explanation for the bias dependent logic upset levels experimentally observed. Parasitic BJT gain calculations, gain modulation and substrate bias effects on transient upset thresholds in static random access memory (SRAM) cells are discussed.
Keywords
Body regions; CMOS technology; Charge carrier density; Doping; Isolation technology; Logic; Photoconductivity; Radiation effects; Read-write memory; Substrates;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1987.4337539
Filename
4337539
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