DocumentCode :
914364
Title :
MONTE: A Program to Simulate the Heterojunction Devices in Two Dimensions
Author :
Tang, Jeffry Y F ; Laux, Steven E.
Author_Institution :
IBM T. J. Watson Research Center, Yorktown Heights, NY, USA
Volume :
5
Issue :
4
fYear :
1986
fDate :
10/1/1986 12:00:00 AM
Firstpage :
645
Lastpage :
652
Abstract :
This paper describes the two-dimensional heterojunction device simulator MONTE. Drift-diffusion forms the basis for the transport of electrons and holes. Finite differences and Gummel´s algorithm have been adopted to solve the coupled equations. Internal electrodes, capping dielectrics, recessed gates, Fermi-level pinning at the device surface, and deep traps in the substrate can all be treated. A heuristic approach has been devised for evaluating the mobility of electrons based on the quasi-Fermi level. Artifacts such as carrier heating in the built-in field are eliminated, but the model does underestimate electron mobility wherever overshoot occurs. Examples of simulation results on Fermi-level pinning, heterojunction Schottky diodes, a recessed gate MODFET, and a GaAs gate heterojunction FET will be presented.
Keywords :
Charge carrier processes; Dielectric devices; Dielectric substrates; Difference equations; Electrodes; Electron mobility; Electron traps; Finite difference methods; Heterojunctions; Surface treatment;
fLanguage :
English
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0278-0070
Type :
jour
DOI :
10.1109/TCAD.1986.1270234
Filename :
1270234
Link To Document :
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