Title :
The High-k Solution
Author :
Bohr, Mark T. ; Chau, Robert S. ; Ghani, Tahir ; Mistry, Kaizad
Author_Institution :
Intel Corp., Santa Clara
Abstract :
The Intel´s Core 2 microprocessors, based on the latest 45-nanometer CMOS process technology have more transistors and run faster and cooler than microprocessors fabricated with the previous, 65-nm process generation. For compute-intensive music, video, and gaming applications, users will see a hefty performance increase.
Keywords :
CMOS digital integrated circuits; high-k dielectric thin films; microprocessor chips; CMOS process technology; Intel´s Core 2 microprocessors; MOSFET; high-k dielectric; size 45 nm; Atomic layer deposition; Chemical industry; Dielectrics and electrical insulation; Electrons; High K dielectric materials; High-K gate dielectrics; Microprocessors; Moore´s Law; Silicon; Transistors;
Journal_Title :
Spectrum, IEEE
DOI :
10.1109/MSPEC.2007.4337663
