• DocumentCode
    914615
  • Title

    The High-k Solution

  • Author

    Bohr, Mark T. ; Chau, Robert S. ; Ghani, Tahir ; Mistry, Kaizad

  • Author_Institution
    Intel Corp., Santa Clara
  • Volume
    44
  • Issue
    10
  • fYear
    2007
  • Firstpage
    29
  • Lastpage
    35
  • Abstract
    The Intel´s Core 2 microprocessors, based on the latest 45-nanometer CMOS process technology have more transistors and run faster and cooler than microprocessors fabricated with the previous, 65-nm process generation. For compute-intensive music, video, and gaming applications, users will see a hefty performance increase.
  • Keywords
    CMOS digital integrated circuits; high-k dielectric thin films; microprocessor chips; CMOS process technology; Intel´s Core 2 microprocessors; MOSFET; high-k dielectric; size 45 nm; Atomic layer deposition; Chemical industry; Dielectrics and electrical insulation; Electrons; High K dielectric materials; High-K gate dielectrics; Microprocessors; Moore´s Law; Silicon; Transistors;
  • fLanguage
    English
  • Journal_Title
    Spectrum, IEEE
  • Publisher
    ieee
  • ISSN
    0018-9235
  • Type

    jour

  • DOI
    10.1109/MSPEC.2007.4337663
  • Filename
    4337663
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=914615