Title :
Analysis of Velocity Saturation and Other Effects on Short-Channel MOS Transistor Capacitances
Author :
Iwai, Hiroshi ; Pinto, Mark R. ; Rafferty, Conor S. ; Oristian, John E. ; Dutton, Robert W.
Author_Institution :
Semiconductor Device Engineering Laboratory, Toshiba Research and Development Center, Kawasaki,Japan
fDate :
3/1/1987 12:00:00 AM
Abstract :
In order to analyze short-channel effects of MOS transistor ac characteristics, a two-dimensional device simulator has been used to extract MOS transistor capacitances. The results of simulation and measurements agree well. The causes of short-channel effects have been understood and explained by the simulations. Two-dimensional effects and velocity saturation are the main causes of short-channel effects in MOS transistor capacitances. Two-dimensional simulation was found to be a useful tool for studying mobility models, as well as for obtaining capacitance models for circuit simulation.
Keywords :
Analytical models; Associate members; Capacitance measurement; Circuit simulation; Laboratories; MOSFETs; Measurement techniques; Physics; Threshold voltage; Very large scale integration;
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
DOI :
10.1109/TCAD.1987.1270261