DocumentCode
914658
Title
Symbolic Layout for Bipolar and MOS VLSI
Author
Szabo, Kevin S. ; Leask, James M. ; Elmasry, Mohamed I.
Author_Institution
Bell-Northern Research, Ottawa, Ontario, Canada
Volume
6
Issue
2
fYear
1987
fDate
3/1/1987 12:00:00 AM
Firstpage
202
Lastpage
210
Abstract
VLSI design requires design methodologies which are tailored to the implementation technology. Symbolic layout has been addressed in the past for MOS technology, while bipolar technology has largely been ignored. This paper describes a novel symbolic design technique which addresses both bipolar and MOS technologies. The technique allows the designer to symbolically layout nMOS, CMOS, and bipolar circuit structures. The symbol set is used for both MOS and bipolar devices in an integrated and consistent way. It is closely related to the mask layout information rather than circuit schematics. Thus, it allows the creation of any circuit structure based on bipolar, MOS, CMOS, BIMOS, and BICMOS technologies. Design examples are given.
Keywords
BiCMOS integrated circuits; CMOS logic circuits; CMOS technology; Design automation; Design methodology; Integrated circuit technology; Low voltage; MOS devices; Silicon; Very large scale integration;
fLanguage
English
Journal_Title
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher
ieee
ISSN
0278-0070
Type
jour
DOI
10.1109/TCAD.1987.1270264
Filename
1270264
Link To Document