DocumentCode
914697
Title
Neodymium-doped silica optical waveguide laser on silicon substrate
Author
Hibino, Yoshinori ; Kitagawa, Takeshi ; Shimizu, Makoto ; Hanawa, Fumiaki ; Sugita, Akio
Author_Institution
NTT Opto-Electron. Lab., Ibaraki, Japan
Volume
1
Issue
11
fYear
1989
Firstpage
349
Lastpage
350
Abstract
A waveguide laser with a Nd-doped silica core fabricated on a Si substrate using flame hydrolysis deposition and reactive ion etching techniques is described The Nd ion concentration was about 2000 p.p.m. and the optical loss at 1.05 mu m was 0.85 dB/cm. CW lasing at a wavelength of 1.0515 mu m with a threshold of about 150 mW was achieved successfully with pumping at 0.80 mu m.<>
Keywords
CVD coatings; chemical vapour deposition; neodymium; optical waveguides; optical workshop techniques; silicon compounds; solid lasers; sputter etching; 0.80 micron; 0.85 dB; 1.05 micron; 1.0515 micron; 150 mW; CW lasing; Nd ion concentration; Nd:SiO/sub 2/ optical waveguide laser; Si substrate; SiO/sub 2/:Nd; flame hydrolysis deposition; optical loss; pumping; reactive ion etching techniques; threshold; wavelength; Fiber lasers; Optical fibers; Optical pumping; Optical refraction; Optical variables control; Optical waveguides; Particle beam optics; Silicon compounds; Stimulated emission; Waveguide lasers;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.43377
Filename
43377
Link To Document