DocumentCode
915496
Title
EASE--An Application-Based CAD System for Process Design
Author
Mar, Jerry ; Bhargavan, Krish ; Duvall, Steven G. ; Firestone, Ram ; Lucey, Dennis J. ; Nandgaonkar, Sharad N. ; Wu, Sheldon ; Yu, Kaung-Shia ; Zarbakhsh, Farshid
Author_Institution
Intel Corporation, Santa Clara, CA, USA
Volume
6
Issue
6
fYear
1987
fDate
11/1/1987 12:00:00 AM
Firstpage
1032
Lastpage
1038
Abstract
A new approach for making process and device simulation tools easier to use is presented. Described is an integrated CAD system for process design in which users select applications rather than tools. CAD simulation methodologies for each application are stored in an applications database and supported by automatic execution modules in the system. A database of "seed files" for initial process parameters are also provided. Both execution automation and the content in user interfaces are tailored to the chosen application to provide for an exceptionally simple and efficient interface, one that minimizes user learning requirements.
Keywords
Computational modeling; Databases; Design automation; Electric breakdown; Hardware; Parasitic capacitance; Personnel; Predictive models; Process design; Solid modeling;
fLanguage
English
Journal_Title
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher
ieee
ISSN
0278-0070
Type
jour
DOI
10.1109/TCAD.1987.1270344
Filename
1270344
Link To Document