Title :
High-resolution pattern replication using soft X rays
Author :
Spears, D.L. ; Smith, Henry I.
Author_Institution :
Massachusetts Institute of Technology, Lincoln Laboratory, Lexington, USA
Abstract :
A soft X ray lithographic technique capable of contactless replication of submicrometre linewidth planar-device patterns is described. Special soft X ray exposure masks have been developed for the 4¿14 Å wavelength region. Elastic-surface-wave-transducer patterns with 1.3 ¿m electrode spacings were fabricated onto such masks using electron-beam techniques, and were successfully replicated.
Keywords :
X-ray applications; gamma-ray applications; integrated circuit production; X-ray lithographic technique; elastic surface wave transducer patterns; electron beam techniques; exposure masks; submicrometre linewidth;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19720074
