DocumentCode :
916948
Title :
High device yield and performance of InGaAsP MQW DFB lasers with absorptive grating
Author :
Park, S.S. ; Park, S.W. ; Yu, J.S.
Author_Institution :
Samsung Electron. Co., Ltd., Suwon
Volume :
43
Issue :
20
fYear :
2007
Firstpage :
1095
Lastpage :
1096
Abstract :
AR/HR-coated, loss-coupled, InGaAsP multiple quantum well distributed feedback lasers emitting at 1.55 mum are reported, indicating a high device yield of ~66% for the quarter of a two-inch wafer and a good reliability as long as 5000 h operation at 85degC with a constant power of 5 mW. The high device yield was achieved by the automatically buried InAsP absorptive grating formed during the heat-up process on InP corrugations and the uniform surface-facing upward wet chemical etching process.
Keywords :
III-V semiconductors; diffraction gratings; distributed feedback lasers; indium compounds; laser beam etching; quantum well lasers; semiconductor device reliability; AR/HR-coating; InAsP; InAsP absorptive grating; InGaAsP; InGaAsP MQW DFB lasers; InGaAsP multiple quantum well distributed feedback lasers; InP; InP corrugations; heat-up process; high device yield; power 5 mW; temperature 85 C; time 5000 h; wavelength 1.55 mum; wet chemical etching process;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20071458
Filename :
4338204
Link To Document :
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