• DocumentCode
    916948
  • Title

    High device yield and performance of InGaAsP MQW DFB lasers with absorptive grating

  • Author

    Park, S.S. ; Park, S.W. ; Yu, J.S.

  • Author_Institution
    Samsung Electron. Co., Ltd., Suwon
  • Volume
    43
  • Issue
    20
  • fYear
    2007
  • Firstpage
    1095
  • Lastpage
    1096
  • Abstract
    AR/HR-coated, loss-coupled, InGaAsP multiple quantum well distributed feedback lasers emitting at 1.55 mum are reported, indicating a high device yield of ~66% for the quarter of a two-inch wafer and a good reliability as long as 5000 h operation at 85degC with a constant power of 5 mW. The high device yield was achieved by the automatically buried InAsP absorptive grating formed during the heat-up process on InP corrugations and the uniform surface-facing upward wet chemical etching process.
  • Keywords
    III-V semiconductors; diffraction gratings; distributed feedback lasers; indium compounds; laser beam etching; quantum well lasers; semiconductor device reliability; AR/HR-coating; InAsP; InAsP absorptive grating; InGaAsP; InGaAsP MQW DFB lasers; InGaAsP multiple quantum well distributed feedback lasers; InP; InP corrugations; heat-up process; high device yield; power 5 mW; temperature 85 C; time 5000 h; wavelength 1.55 mum; wet chemical etching process;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20071458
  • Filename
    4338204