Title :
Growth of Electron-Doped Superconductor
Films and Their Applications to Intrinsic Josephson Junctions
Author :
Yuan, Jie ; Wang, Huabing ; Iguchi, Ienari ; Hsu, Yungyuan ; Arisawa, Shunichi ; Ishii, Akira ; Hatano, Takeshi
Author_Institution :
Nano Syst. Functionality Center, Nat. Inst. for Mater. Sci. (NIMS), Tsukuba, Japan
fDate :
6/1/2009 12:00:00 AM
Abstract :
As a typical electron-doped high-T c superconductor, Pr0.9LaCe0.1CuO4 (PLCCO) single crystal samples were widely studied. In this work, superconducting PLCCO films have been successfully prepared by pulsed laser deposition method. The zero resistance transition temperature of the films deposited under optimal condition is up to 24.0 K, equal to the reported value of single crystals with the same composition. Further, in PLCCO micro-bridges structured across a low-angle step on SrTiO3 (100) substrates, typical hysteresis and multiple resistive branches were observed in the current-voltage curves. These transport properties can be understood as so-called intrinsic Josephson effects, resulting from the tunneling between interleaving superconducting and non-superconducting layers in anisotropic superconductors. While this confirms the high quality of the films, more investigations are necessary for the potential applications in superconductor electronics.
Keywords :
Josephson effect; cerium compounds; doping profiles; high-temperature superconductors; lanthanum compounds; praseodymium compounds; pulsed laser deposition; superconducting thin films; superconducting transition temperature; Pr0.9LaCe0.1CuO4; SrTiO3; SrTiO3(100)-substrates; anisotropic superconductor; current-voltage curve; electron-doped superconductor; high-Tc superconductors; hysteresis; intrinsic josephson junction; microbridge structure; optimal condition; pulsed laser deposition method; superconductor electronics; superconductor film; transport property; tunneling; zero resistance transition temperature; Electron-doped superconductor; film; intrinsic Josephson junction;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
DOI :
10.1109/TASC.2009.2018525