DocumentCode
918179
Title
Concerning electromigration in thin films
Author
Blair, J.C.
Volume
59
Issue
6
fYear
1971
fDate
6/1/1971 12:00:00 AM
Firstpage
1023
Lastpage
1024
Abstract
Comments are made on a recent paper by Hofman and Breitling on the rate of electromigration in thin films. It is shown that the simple concept of electron momentum transfer leads to a quadratic relation between the current density and rate of electromigration, in agreement with Black. Comments on the difficulty of relating this rate to failure times of metal conductors are also presented.
Keywords
Current density; Electromigration; Electrons; Equations; Notice of Violation; Propagation losses; Temperature; Transistors; Transmission lines; Writing;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/PROC.1971.8315
Filename
1450245
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