DocumentCode :
918487
Title :
Some Recent Topics of Non-equilibrium Discharge Plasma Technologies - Their Widespread Use from Low Pressure to Atmospheric Pressure
Author :
Nakano, Toshiki
Author_Institution :
Nat. Defense Acad., Yokosuka
Volume :
14
Issue :
5
fYear :
2007
fDate :
10/1/2007 12:00:00 AM
Firstpage :
1081
Lastpage :
1087
Abstract :
Non-equilibrium discharge plasmas have been utilized in a variety of fields and are indispensable to material processing, nanotechnologies and biotechnologies besides conventional applications such as light sources. In this review, neutral beam etching, advanced oxidation, protein removal, combustion control and volume, non-equilibrium discharge generation at atmospheric pressure are chosen and summarized as the recent, typical applications of the non-equilibrium discharge plasmas generated from low pressure to atmospheric pressure. A brief introduction of non-equilibrium discharge plasmas is also given, which serves comprehensive understanding of the physics and chemistry behind the technology.
Keywords :
combustion; etching; glow discharges; plasma materials processing; atmospheric pressure; biotechnologies; combustion control; discharge plasma technologies; light sources; nanotechnologies; neutral beam etching; oxidation; plasma materials-processing; pressure glow discharge; protein removal; sterilization; Atmospheric-pressure plasmas; Biotechnology; Fault location; Light sources; Nanostructured materials; Particle beams; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma sources;
fLanguage :
English
Journal_Title :
Dielectrics and Electrical Insulation, IEEE Transactions on
Publisher :
ieee
ISSN :
1070-9878
Type :
jour
DOI :
10.1109/TDEI.2007.4339467
Filename :
4339467
Link To Document :
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