DocumentCode
91945
Title
Nonquasi-Static Charge Model for Common Double-Gate MOSFETs Adapted to Gate Oxide Thickness Asymmetry
Author
Sharan, Neha ; Mahapatra, Santanu
Author_Institution
Dept. of Electron. Syst. Eng., Indian Inst. of Sci., Bangalore, India
Volume
60
Issue
7
fYear
2013
fDate
Jul-13
Firstpage
2419
Lastpage
2422
Abstract
With the unique quasi-linear relationship between the surface potentials along the channel, recently we have proposed a quasi-static terminal charge model for common double-gate MOSFETs, which might have asymmetric gate oxide thickness. In this brief, we extend this concept to develop the nonquasi-static (NQS) charge model for the same by solving the governing continuity equations. The proposed NQS model shows good agreement against TCAD simulations and appears to be useful for efficient circuit simulation.
Keywords
MOSFET; semiconductor device models; NQS charge model; asymmetric gate oxide thickness; circuit simulation; double-gate MOSFET; gate oxide thickness asymmetry; nonquasistatic charge model; quasilinear relationship; quasistatic terminal charge model; surface potential; Compact modeling; double-gate (DG) MOSFET; nonquasi-static (NQS) effect;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2013.2262943
Filename
6525382
Link To Document