• DocumentCode
    91945
  • Title

    Nonquasi-Static Charge Model for Common Double-Gate MOSFETs Adapted to Gate Oxide Thickness Asymmetry

  • Author

    Sharan, Neha ; Mahapatra, Santanu

  • Author_Institution
    Dept. of Electron. Syst. Eng., Indian Inst. of Sci., Bangalore, India
  • Volume
    60
  • Issue
    7
  • fYear
    2013
  • fDate
    Jul-13
  • Firstpage
    2419
  • Lastpage
    2422
  • Abstract
    With the unique quasi-linear relationship between the surface potentials along the channel, recently we have proposed a quasi-static terminal charge model for common double-gate MOSFETs, which might have asymmetric gate oxide thickness. In this brief, we extend this concept to develop the nonquasi-static (NQS) charge model for the same by solving the governing continuity equations. The proposed NQS model shows good agreement against TCAD simulations and appears to be useful for efficient circuit simulation.
  • Keywords
    MOSFET; semiconductor device models; NQS charge model; asymmetric gate oxide thickness; circuit simulation; double-gate MOSFET; gate oxide thickness asymmetry; nonquasistatic charge model; quasilinear relationship; quasistatic terminal charge model; surface potential; Compact modeling; double-gate (DG) MOSFET; nonquasi-static (NQS) effect;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2262943
  • Filename
    6525382