• DocumentCode
    919730
  • Title

    Electrical properties of some thin-film semiconductor alloys

  • Author

    Weng, Tung H.

  • Author_Institution
    Oakland University, Rochester, Mich.
  • Volume
    59
  • Issue
    10
  • fYear
    1971
  • Firstpage
    1503
  • Lastpage
    1505
  • Abstract
    The Müller technique of flash evaporating powdered compound semiconductors was used to form polycrystalline thin-film solid solutions of CdSe-CdS and CdSe-CdTe onto heated glass substrates. The composition of each alloy was varied from 10 to 90 percent of one compound by weight. X-ray diffractometer was used to determine their crystalline structures and lattice parameters. The results show that all CdSe-CdS alloys have a hexagonal structure regardless of their composition and that CdSe-CdTe alloys have both cubic and hexagonal structures depending on the composition of the constituent compounds. The lattice parameters were found to vary linearly with the composition for each alloy. Electrical properties of these thin-film alloys in terms of Hall mobility and carrier concentration were determined at room temperature as a function of substrate temperature which ranged from 50°C to 200°C. The results indicate that the film properties depend heavily on the preparation conditions, such as evaporation rate, vacuum pressure, and substrate temperature. The latter factor appeared to have dominated their properties to a great extent. Films prepared at higher substrate temperatures tended to have both low carrier mobility and concentration. All films, however, show an n-type conduction regardless of their composition and preparation conditions. Measurements of dark current versus temperature were also carried out in nitrogen atmosphere. From these measurements, the imperfection ionization energies of films prepared at various substrate temperatures were determined.
  • Keywords
    Atmospheric measurements; Crystallization; Glass; Lattices; Semiconductor materials; Semiconductor thin films; Solids; Substrates; Temperature distribution; X-ray diffraction;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/PROC.1971.8461
  • Filename
    1450391