Direct measurement of base drift field in bipolar transistors

The authors have developed a method to measure an effective base drift field and the base transit-time reduction factor of bipolar transistors, by measuring the excess phase of the base transport factor. This technique relies on measuring small-signal characteristics of the transistor at a low frequency and following the phase of the transconductance at the frequency approaching and exceeding the unit current gain frequency (f/sub T/). With this technique, the authors verify that the effective drift inside the base of Si bipolar transistors decreases with increased base implantation energy and thermal treatment. Such directly measured drift-dependent base transport provides additional insight for optimizing processing used in bipolar technology development.<>