Title :
Characteristics of ion-implanted hybrid voltage-variable capacitors
Author_Institution :
General Motors Research Laboratories, Electronics & Instrumentation Department, Warren, USA
Abstract :
Hybrid voltage-variable capacitors were fabricated with hyperabrupt ion-implanted doping profiles. The capacitance uniformity was within 2% over the operating voltage range. Losses in the low-bias-voltage range were reduced by a factor of 3 by a 475°C anneal in N2¿H2. A small bias-temperature instability was observed.
Keywords :
annealing; capacitance; ion implantation; varactors; annealing; capacitance; capacitors; ion implantation; varactors;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19730153
